ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,768,912, issued on Oct. 20, was assigned to Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO ('s-Gravenhage, Netherlands).
"Metrology device and method" was invented by Abbas Mohtashami ('s-Gravenhage, Netherlands), Clara Ines Osorio Tamayo (Delft, Netherlands) and Kodai Hatakeyama (Pijnacker, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology device for determining metrological characteristics of a sample is described that includes a probe, a scanning mechanism, a radiation source, an optical sensor and a signal processor. In operation the scanning mechanism displaces the probe relative to the sample, alon...