US Patent Issued to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on Nov. 3 for "Semiconductor element, semiconductor integrated circuit, and production method for semiconductor element" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,324, issued on Nov. 3, was assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Tokyo).

"Semiconductor element, semiconductor integrated circuit, and production method for semiconductor element" was invented by Kimihiko Kato (Ibaraki, Japan), Takahiro Mori (Ibaraki, Japan), Shota Iizuka (Ibaraki, Japan), Takashi Nakayama (Chiba, Japan), Sanghun Cho (Chiba, Japan) and Jyurai Kato (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a semiconductor element capable of being manufactured in small size, easily and at a low cost and obtaining a large on-current, a semiconduct...