US Patent Issued to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on Aug. 25 for "ScAlN laminate and manufacturing method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,715,768, issued on Aug. 25, was assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan).

"ScAlN laminate and manufacturing method thereof" was invented by Kenji Hirata (Tosu, Japan), Hiroshi Yamada (Tosu, Japan), Masato Uehara (Tosu, Japan), Sri Ayu Anggraini (Tosu, Japan) and Morito Akiyama (Tosu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This ScAlN laminate includes a substrate, an intermediate layer formed on the substrate and a ScAlN thin film formed on the intermediate layer, and a nearest neighbor distance, which is a distance between atoms closest to each other in a lattice plane parallel to a surface of th...