US Patent Issued to National Chung Cheng University on Feb. 24 for "Electromagnetic wave reflecting structure and manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,497, issued on Feb. 24, was assigned to National Chung Cheng University (Chiayi County, Taiwan).

"Electromagnetic wave reflecting structure and manufacturing method thereof" was invented by Sheng-Fuh Chang (Chiayi County, Taiwan), Chia-Chan Chang (Chiayi, Taiwan), Shih-Cheng Lin (Taitung County, Taiwan), Wei-Yang Chen (Changhua County, Taiwan) and Yu-Cheng Lin (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing an electromagnetic wave reflecting structure includes the steps of presetting an operating frequency, a reflected wave pointing angle, an incident wave pointing angle, and an incident distance of an elec...