US Patent Issued to NANYA TECHNOLOGY on Oct. 27 for "Method of manufacturing semiconductor device" (Taiwanese Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,906, issued on Oct. 27, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Method of manufacturing semiconductor device" was invented by Jui Wen Ho (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a method of manufacturing a semiconductor device. The method includes: providing a semiconductor structure, in which the semiconductor structure includes nitride portions wrapping a nitride layer and an oxide layer, a contact layer between the nitride portions, a spacer layer disposed on the nitride portions, and a patterned hardmask layer on the spacer layer; forming a filling material...