US Patent Issued to NANYA TECHNOLOGY on Oct. 20 for "Method of manufacturing semiconductor structure" (Taiwanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,758, issued on Oct. 20, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Method of manufacturing semiconductor structure" was invented by Yubon Chiang (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor structure includes forming bit line structures on a substrate; forming a dielectric layer on the substrate and between the bit line structures; forming a layer stack including a plasma treated oxygen-rich ARC layer and a silicon-rich ARC layer on the dielectric layer; forming a patterned mask layer including a mask feature and an opening on the layer stack, the opening ha...