ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,355, issued on May 12, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).
"Capacitor structure and method for fabricating the same" was invented by Da-Zen Chuang (Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "This invention provides a capacitor structure includes a U-shaped bottom electrode having a cap dielectric provided at its open end, a top electrode and a capacitor dielectric layer interposed between the bottom electrode and the top electrode to constitute an outer capacitor around a cylinder type solid inner capacitor, and the outer capacitor and the inner capacitor are divided by the cap dielectric. The cyl...