US Patent Issued to NANYA TECHNOLOGY on June 9 for "Semiconductor structure and method of manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,793, issued on June 9, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Semiconductor structure and method of manufacturing the same" was invented by Yao-Hsiung Kung (Taoyuan City, Taiwan), Yu-Li Wu (New Taipei City, Taiwan) and Shao-En Yeh (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a semiconductor structure and a method of manufacturing a semiconductor structure. The semiconductor structure includes: a data storage unit in a first dielectric layer; a word line disposed over the data storage unit; an array of conductive pads disposed over the word line; a hard mask layer disp...