US Patent Issued to NANYA TECHNOLOGY on April 21 for "Method of patterning a semiconductor structure" (Taiwanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,766, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Method of patterning a semiconductor structure" was invented by Kai Zhang (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure provides a method of patterning a semiconductor structure. A first composite substrate including first spacers on a first substrate and a second composite substrate including second spacers on a second substrate are received. The second composite substrate is disposed on the first composite substrate, in which at least one of the first spacers is in direct contact with at least one of the second spac...