US Patent Issued to Nanotronics Imaging on March 24 for "Process variability simulator for manufacturing processes" (Florida, New York Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,839, issued on March 24, was assigned to Nanotronics Imaging Inc. (Cuyahoga Falls, Ohio).

"Process variability simulator for manufacturing processes" was invented by John B. Putman (Celebration, Fla.), Matthew C. Putman (Brooklyn, N.Y.), Jonathan Lee (Brooklyn, N.Y.), Sarah Constantin (Brooklyn, N.Y.) and Damas Limoge (Brooklyn, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computing system receives one or more process parameters to be optimized during a multi-step manufacturing process. The computing system initiates a process prediction model in accordance with the one or more process parameters. The computing system simulates the multi-s...