US Patent Issued to Nanotronics Imaging on June 16 for "Line defect detection" (New York Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,657,686, issued on June 16, was assigned to Nanotronics Imaging Inc. (Cuyahoga Falls, Ohio).

"Line defect detection" was invented by Joanna Lee (Brooklyn, N.Y.), Jacob Keith (Brooklyn, N.Y.) and Anuj Doshi (Long Island City, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computing system generates a training data set for training a machine learning model to detect line defects on a surface of a specimen. The computing system trains the machine learning model to detect line defects based on the training data set. The machine learning model is trained to detect line defects by detecting the individual defects represented by the plurality of annotat...