US Patent Issued to Nanoscribe Holding on Aug. 4 for "Laser lithography device and method for producing a three-dimensional structure" (German Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,329, issued on Aug. 4, was assigned to Nanoscribe Holding GmbH (Eggenstein-Leopoldshafen, Germany).

"Laser lithography device and method for producing a three-dimensional structure" was invented by Marc Hippler (Eggenstein-Leopoldshafen, Germany) and Michael Thiel (Karlsruhe, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laser lithography device for producing a three-dimensional structure in a lithographic material comprising a laser source for emitting a laser writing beam and a lens for focusing the laser writing beam in a focus region. The lens has an optical terminating element. Furthermore, the laser lithography device comprises a sca...