US Patent Issued to Nano and Advanced Materials Institute on March 24 for "Photopolymer for anti-yellowing and anti-thermal cracking applications" (Chinese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,583,958, issued on March 24, was assigned to Nano and Advanced Materials Institute Ltd. (Hong Kong).

"Photopolymer for anti-yellowing and anti-thermal cracking applications" was invented by Liang Zhang (Hong Kong), Kin Cheung Chan (Hong Kong), Chun Kwong Yeung (Hong Kong) and Jifan Li (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "An acrylate based photopolymer with high yellowing resistance, excellent photo sensitivity, high toughness, and high glass transition temperature, methods of preparation and used thereof, and solders comprising the same."

The patent was filed on March 8, 2022, under Application No. 17/653,886.

*For further inform...