US Patent Issued to Nano and Advanced Materials Institute on March 17 for "Photochromic compositions" (Chinese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,454, issued on March 17, was assigned to Nano and Advanced Materials Institute Ltd. (Hong Kong, Hong Kong).

"Photochromic compositions" was invented by Nathan Man-Wai Wu (Hong Kong, Hong Kong), Chi Ho Kwok (Hong Kong, Hong Kong), Chaau Yan Poon (Hong Kong, Hong Kong) and Chenmin Liu (Hong Kong, Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photochromic composition having at least one photochromic naphthopyran-based component with R' and R" groups selected from hydrogen, alkyl, fluorinated alkyl, alkenyl, alkynyl, alkylaryl, cycloalkyl, alkoxy, halogen, amine, carbonate ester, carboxylate, aryl, substituted aryl, heteroaryl, substituted...