ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,127, issued on April 14, was assigned to Nano and Advanced Materials Institute Ltd. (Hong Kong, Hong Kong).
"Impact dissipating bollard" was invented by Kang Zhang (Hong Kong, Hong Kong), Xiyao Zhang (Hong Kong, Hong Kong), Meishan Chan (Hong Kong, Hong Kong), Shilong Zhang (Hong Kong, Hong Kong), Christopher Cheung Yec (Hong Kong, Hong Kong), Pak Chung Lau (Hong Kong, Hong Kong), Jifan Li (Hong Kong, Hong Kong), Jian Zhang (Hong Kong, Hong Kong), Jianzhuo Xin (Hong Kong, Hong Kong) and Jianying Miao (Hong Kong, Hong Kong).
According to the abstract* released by the U.S. Patent & Trademark Office: "An impact dissipating bollard system includes a vertical stanchion and a composit...