ALEXANDRIA, Va., March 24 -- United States Patent no. 12,586,759, issued on March 24, was assigned to MKS Inc. (Andover, Mass.).
"Pulsed RF plasma generator with high dynamic range" was invented by Ky Luu (Victor, N.Y.), Jonathan Smyka (Rochester, N.Y.) and Aaron Radomski (Conesus, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A RF power generator having a fixed power generation section. The fixed power generation section includes a first plurality of power amplifiers each configured to receive a supply voltage and to output a respective first voltage. The RF power generator also includes a weighted power generation section including a plurality of weighted power amplifier modules. Each weighted power ...