US Patent Issued to MKS on July 28 for "Plasma process control of multi-electrode systems equipped with ion energy sensors" (New York, Florida Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,058, issued on July 28, was assigned to MKS Inc. (Andover, Mass.).

"Plasma process control of multi-electrode systems equipped with ion energy sensors" was invented by Linnell Martinez (Lakeland, Fla.), David Miller (Rochester, N.Y.) and Aaron Radomski (Conesus, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A RF generator includes a first RF power source configured to output a first RF output signal to a first electrode of a load. The RF generator includes a first sensor for detecting a first parameter of the first RF output signal and determining a first characteristic of a plasma in the load. A second RF power source outputs a second RF outp...