US Patent Issued to Mitutoyo on June 30 for "Lighting configuration for metrology system with images acquired at different focus positions" (Washington Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,905, issued on June 30, was assigned to Mitutoyo Corp. (Kanagawa-ken, Japan).

"Lighting configuration for metrology system with images acquired at different focus positions" was invented by Christopher Richard Hamner (Kirkland, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lighting configuration is provided for utilization with a metrology system. The metrology system includes a camera that provides images of a workpiece at different focus positions (e.g., through operation of a variable focal length lens). The lighting configuration includes a plurality of lighting portions which illuminate the workpiece for the imaging. The lighting porti...