US Patent Issued to Mitutoyo on June 16 for "Metrology system with position and orientation tracking utilizing patterns of light beams" (Washington Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,153, issued on June 16, was assigned to Mitutoyo Corp. (Kangawa-Ken, Japan).

"Metrology system with position and orientation tracking utilizing patterns of light beams" was invented by Norman Laman (Kenmore, Wash.) and Nick Hartmann (Kirkland, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system is provided for use with a movement system that moves an end tool. The metrology system includes a sensor configuration, a light beam source configuration and a processing portion. The light beam source configuration directs a first pattern of light beams and a second pattern of light beams to light beam sensors to indicate a position and ...