ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,167, issued on July 14, was assigned to Mitutoyo Corp. (Kanagawa-Ken, Japan).
"Radar metrology system" was invented by Nick Hartmann (Kirkland, Wash.) and Ted Staton Cook (Kirkland, Wash.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A radar metrology system is provided for use with a movement system (e.g., a robot arm) that moves an end tool, and includes mobile and stationary radar configurations. The mobile radar configuration includes mobile radar components that are coupled to the end tool or an end tool mounting configuration. The stationary radar configuration includes stationary radar components (e.g., which define a metrology frame volume ...