US Patent Issued to MITSUI KINZOKU on May 5 for "Film-forming material" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,617,692, issued on May 5, was assigned to MITSUI KINZOKU COMPANY Ltd. (Tokyo).

"Film-forming material" was invented by Ryuichi Sato (Omuta, Japan), Naoki Fukagawa (Omuta, Japan), Yuji Shigeyoshi (Omuta, Japan) and Kento Matsukura (Omuta, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film-forming material of the present invention contains an oxyfluoride of yttrium represented by YOXFY (X and Y are numbers satisfying 0greater thanX and Xgreater thanY) and YF3, wherein a ratio I2/I1 of a peak height I2 of the (020) plane of YF3 to a peak height I1 of the main peak of YOXFY as analyzed by XRD is from 0.005 to 100. It is preferable that a ratio I4/I1 ...