US Patent Issued to MITSUI CHEMICALS on July 14 for "Pellicle, exposure master, exposure device, pellicle production method and test method for mask adhesive layer" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,381, issued on July 14, was assigned to MITSUI CHEMICALS INC. (Tokyo).

"Pellicle, exposure master, exposure device, pellicle production method and test method for mask adhesive layer" was invented by Yutaka Yoshimura (Tokyo), Keiichi Kakihara (Tokyo), Ryo Tanaka (Tokyo), Yuji Maruyama (Tokyo), Masatsugu Higashi (Tokyo), Masakazu Yamauchi (Tokyo) and Tomokazu Tanaka (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a pellicle, including a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein when an attachment portion S1 of the adhesive layer to a quartz mask is irradiated with xenon ...