US Patent Issued to MITSUI CHEMICALS on Aug. 25 for "Curable composition for stereolithography, evaporative pattern, and method for producing three-dimensional article" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,715,949, issued on Aug. 25, was assigned to MITSUI CHEMICALS INC. (Tokyo).

"Curable composition for stereolithography, evaporative pattern, and method for producing three-dimensional article" was invented by Takaaki Hayashi (Funabashi, Japan) and Toshikazu Sakamaki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A curable composition for stereolithography, comprising a photopolymerizable component and a photopolymerization initiator, wherein a cured product of the curable composition has a minimum value of a storage elastic modulus, in a range of from 25deg C. to 300deg C., of not greater than 1.20x107 Pa."

The patent was filed on March 28, 2019,...