US Patent Issued to MIKRO MESA TECHNOLOGY on Sept. 1 for "Method of manufacturing structure having a metal layer including electrode and anodized segments through the use of patterned photoresist" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,224, issued on Sept. 1, was assigned to MIKRO MESA TECHNOLOGY Co. LTD. (Apia, Samoa).

"Method of manufacturing structure having a metal layer including electrode and anodized segments through the use of patterned photoresist" was invented by Li-Yi Chen (Tainan City, Taiwan) and Chieh-Ting Chen (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a structure having an electrode and an anodized part includes: forming a top metal layer on a substrate; forming a top patterned photoresist on the top metal layer to expose a portion of a top surface of the top metal layer, in which the top patterned photoresist has...