ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,292, issued on Sept. 1, was assigned to MIKRO MESA TECHNOLOGY Co. LTD. (Apia, Samoa).

"Method of manufacturing electrode structure" was invented by Li-Yi Chen (Tainan City, Taiwan) and Chieh-Ting Chen (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing an electrode structure includes: etching the bottom metal layer through a first patterned photoresist including first and second mask portions to form a first metal pattern, a second metal pattern, and a bridge connected therebetween; removing the first mask portion; anodizing the bottom metal layer with the remained second mask portion by flowing an anodizin...