ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,388, issued on June 30, was assigned to MIKRO MESA TECHNOLOGY Co. LTD. (Apia, Samoa).

"Method of manufacturing micro devices" was invented by Li-Yi Chen (Tainan City, Taiwan) and Hsiao-Fu Lu (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing micro devices includes: preparing a III-nitride epitaxial structure including a p-type III-nitride layer, an n-type III-nitride layer on the p-type III-nitride layer, a AlxIII_others1-xN layer on the n-type III-nitride layer, and an undoped III-nitride layer on the AlxIII_others1-xN layer; forming a photoresist layer on the III-nitride epitaxial structure to contact the...