US Patent Issued to Micron Technology on Sept. 8 for "Programmable chalcogenide capacitors" (Idaho, Minnesota, Washington Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,737, issued on Sept. 8, was assigned to Micron Technology Inc (Boise, Idaho).

"Programmable chalcogenide capacitors" was invented by Hongmei Wang (Boise, Idaho), Huiqi Gong (Redmond, Wash.), Peng Zhao (Boise, Idaho), Jingshan Wang (Eagan, Minn.) and Giovanni Ferrari (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and devices for programmable chalcogenide capacitors are described. A first programming pulse may be applied, for a first duration, to a capacitor comprising a chalcogenide material to adjust a capacitance of the capacitor from a first capacitance to a second capacitance. A pulse may be applied to the capacito...