US Patent Issued to Micron Technology on Oct. 27 for "Microelectronic devices including contact structures, and related electronic systems and methods" (Singaporean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,916, issued on Oct. 27, was assigned to Micron Technology Inc. (Boise, Idaho).

"Microelectronic devices including contact structures, and related electronic systems and methods" was invented by Zhou Xuan (Singapore), Sijia Yu (Singapore) and Biow Hiem Ong (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "A microelectronic device comprises a stack structure comprising alternating conductive structures and insulative structures arranged in tiers. Each of the tiers individually comprises a conductive structure and an insulative structure. The microelectronic device comprises a staircase structure having steps comprising lateral ends of the tier...