US Patent Issued to Micron Technology on July 28 for "Support structure for multiple, alternating epitaxial silicon" (Idaho Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,438, issued on July 28, was assigned to Micron Technology Inc. (Boise, Idaho).

"Support structure for multiple, alternating epitaxial silicon" was invented by Si-Woo Lee (Boise, Idaho), Scott E. Sills (Boise, Idaho), David K. Hwang (Boise, Idaho), Yoshitaka Nakamura (Boise, Idaho), Yuanzhi Ma (Boise, Idaho) and Glen H. Walters (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, methods and apparatus are provided for an array of vertically stacked memory cells having horizontally oriented access devices and storage nodes. The horizontally oriented access devices having a first source/drain regions and a second source drain regions s...