US Patent Issued to Micron Technology on July 14 for "Apparatus and electronic devices including transistors comprising two-dimensional materials" (California, Idaho Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,814, issued on July 14, was assigned to Micron Technology Inc. (Boise, Idaho).

"Apparatus and electronic devices including transistors comprising two-dimensional materials" was invented by Witold Kula (Gilroy, Calif.), Gurtej S. Sandhu (Boise, Idaho) and John A. Smythe (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus including an array of memory cells comprising transistors is disclosed. One or more of the transistors comprise a crystalline material extending substantially transverse to a base material. A gate dielectric material is adjacent to the crystalline material. A two-dimensional material of a channel region directly...