ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,631, issued on Aug. 11, was assigned to Micron Technology Inc. (Boise, Idaho).
"Damascene digit lines" was invented by Russell A. Benson (Boise, Idaho), Terrence B. McDaniel (Boise, Idaho) and Vinay Nair (Boise, Idaho).
According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, methods and apparatus are provided for damascene digit lines. For instance, a damascene digit line can be formed by forming a plurality of dummy digit lines on a semiconductor substrate that are separated by a first set of vertical trenches, depositing a sacrificial insulating material in the first set of vertical trenches, forming, and depositing an insulating fill material in, a...