US Patent Issued to Microchip Technology on Nov. 3 for "Apparatus for controlling vapor pressure of a subject material contained therein, and related methods and systems" (Massachusetts, California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,980, issued on Nov. 3, was assigned to Microchip Technology Inc. (Chandler, Ariz.).

"Apparatus for controlling vapor pressure of a subject material contained therein, and related methods and systems" was invented by Robert Lutwak (Pelham, Mass.), Lichung Ha (Wakefield, Mass.) and Bomy Chen (Newark, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus includes a body having walls defining a cavity therebetween, the cavity containing an amount of a subject material therein. A channel structure including a channel substrate with channels having a substantially uniform width formed therein is disposed along a portion of the walls of the bod...