US Patent Issued to Microchip Technology on Aug. 25 for "Techniques for controlling vapor pressure of subject materials in vapor cells and related methods" (Massachusetts Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,719,485, issued on Aug. 25, was assigned to Microchip Technology Inc. (Chandler, Ariz.).

"Techniques for controlling vapor pressure of subject materials in vapor cells and related methods" was invented by Robert Lutwak (Marblehead, Mass.) and Lichung Ha (Wakefield, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a vapor cell includes forming a body of the vapor cell having walls defining a cavity thereinbetween, the cavity having an amount of a subject material contained therein. The method also includes forming a pore structure having a substrate material with pores of a substantially uniform dimension formed therein, the...