ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,426, issued on March 24, was assigned to MetOx International Inc. (Houston).
"Susceptor for a chemical vapor deposition reactor" was invented by Shahab Khandan (Houston), Alex Ignatiev (Houston), Mikhail Novozhilov (Houston) and W. James Jewitt (Houston).
According to the abstract* released by the U.S. Patent & Trademark Office: "A susceptor used in a deposition reactor provides heat input and controls the build-up of errant deposition. The susceptor heats a substrate tape within the reactor upon which one or more thin films are deposited, particularly high temperature superconductor (HTS) thin films produced in a MOCVD reactor."
The patent was filed on Feb. 12, 2021, under App...