US Patent Issued to Merck Patent on March 24 for "Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof" (American, South Korean Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,583,961, issued on March 24, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof" was invented by Durairaj Baskaran (Bridgewater, N.J.), Md S. Rahman (Flemington, N.J.), Sachin Bobade (Somerville, N.J.), Edward W. Ng (Belle Mead, N.J.), Victor Monreal (Breinigsville, Pa.) and EunJeong Jeong (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed subject matter relates to a block polymer comprising structure (1): (A)-(C)-(B), wherein (A) is a first polymer block segment comprising a block...