US Patent Issued to Merck Patent on July 14 for "Method for manufacturing a resist pattern using an aqueous cleaning solution comprising a C4-C12 alkylcarboxylic acid" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,053, issued on July 14, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Method for manufacturing a resist pattern using an aqueous cleaning solution comprising a C4-C12 alkylcarboxylic acid" was invented by Kazuma Yamamoto (Kakegawa, Japan), Tomoyasu Yashima (Kakegawa, Japan) and Maki Ishii (Kakegawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqueous solution comprising an alkylcarboxylic acid compou...