US Patent Issued to Merck Patent on Feb. 24 for "Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b-poly(methyl methacrylate) diblock copolymers and their formulation thereof" (New Jersey, Pennsylvania Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,559,644, issued on Feb. 24, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b-poly(methyl methacrylate) diblock copolymers and their formulation thereof" was invented by Durairaj Baskaran (Bridgewater, N.J.), Md S. Rahman (Flemington, N.J.) and Victor Monreal (Breinigsville, Pa.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the us...