ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,222, issued on March 3, was assigned to MELEXIS TECHNOLOGIES SA (Bevaix, Switzerland).
"Semiconductor device with embedded magnetic flux concentrator" was invented by Appolonius Jacobus Van Der Wiel (Duisburg, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A magnetic flux concentrator (MFC) structure comprises a substrate, a first metal layer disposed on or over the substrate, and a second metal layer disposed on or over the first metal layer. Each metal layer comprises (i) a first wire layer comprising first wires conducting electrical signals, and (ii) a first dielectric layer disposed on the first wire layer. A magnetic flux concentrator ...