ALEXANDRIA, Va., June 16 -- United States Patent no. 12,655,026, issued on June 16, was assigned to Massachusetts Institute of Technology (Cambridge, Mass.) and King Fahd University of Petroleum & Minerals (Dhahran, Saudi Arabia).
"Formation of pores in atomically thin layers" was invented by Piran Kidambi (Somerville, Mass.), Ahmed Ibrahim (Dhahran, Saudi Arabia), Tahar Laoui (Dhahran, Saudi Arabia), Jing Kong (Winchester, Mass.), Rohit N. Karnik (Cambridge, Mass.) and Sui Zhang (Kent Vale, Singapore).
According to the abstract* released by the U.S. Patent & Trademark Office: "Atomically thin layers including pores, their method of manufacture, and their use are disclosed. In some embodiments, pores may be formed in an atomically thin la...