US Patent Issued to Ma Peifeng on May 12 for "Complex scene deformation monitoring and classifying method based on InSAR and deep learning self-attention model" (Chinese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,255, issued on May 12, was assigned to Ma Peifeng (Shenzhen, China).

"Complex scene deformation monitoring and classifying method based on InSAR and deep learning self-attention model" was invented by Peifeng Ma (Shenzhen, China), Zherong Wu (Shenzhen, China) and Yi Zheng (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a complex scene deformation monitoring and classifying method based on interferometric synthetic aperture radar (InSAR) and a deep learning self-attention model, including: generating a deformation interferogram by using an InSAR extraction technology combining persistent scatterer (PS) points and distribut...