US Patent Issued to LuminaMask on Sept. 1 for "Photomask for extreme ultraviolet" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,341, issued on Sept. 1, was assigned to LuminaMask Co. Ltd. (Cheonan-si, South Korea).

"Photomask for extreme ultraviolet" was invented by Seong Yoon Kim (Seoul, South Korea), Tae Young Kim (Seoul, South Korea), GeonGon Lee (Seoul, South Korea), Min Gyo Jeong (Seoul, South Korea), Sung Hoon Son (Seoul, South Korea) and Inkyun Shin (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet photomask includes a conductive layer; a substrate disposed on the conductive layer; a multilayer, comprising different metals alternately stacked on the substrate; a protective layer disposed on the multilayer; a low-reflectance part...