ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,772, issued on July 21, was assigned to LuminaMask Co. Ltd. (Cheonan-si, South Korea).
"Shadow mask and method of manufacturing blank mask using the same" was invented by Seong Yoon Kim (Seoul, South Korea), GeonGon Lee (Seoul, South Korea), Min Gyo Jeong (Seoul, South Korea), Sung Hoon Son (Seoul, South Korea) and Inkyun Shin (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A shadow mask includes a mask including one surface, another surface, and an opening that passes from one surface to the other, and a shutter provided on the one surface of the mask and configured to adjust a size of the opening, wherein the shutter is configur...