US Patent Issued to LG INNOTEK on March 17 for "Mask" (South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,576,004, issued on March 17, was assigned to LG INNOTEK Co. LTD. (Seoul, South Korea).

"Mask" was invented by Beom Sun Hong (Seoul, South Korea), Hae Rok Son (Seoul, South Korea), Gyu Lin Lee (Seoul, South Korea), Min Seok Oh (Seoul, South Korea) and Mi Sun Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask according to an embodiment comprises: a body having a shape corresponding to a user's face; a first recess disposed on one surface of the body, opposite to the user's face; and a piezoelectric part disposed in the first recess, wherein the first recess has a shape recessed outward from the one surface of the body and is di...