ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,253, issued on Nov. 3, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus" was invented by Chiyoung Choi (Seoul, South Korea), Hojung Kim (Seoul, South Korea), Sangkyun Baek (Seoul, South Korea), Yeongcheol Mun (Seoul, South Korea) and Yongmin Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus includes a mask body that defines a suction hole and a discharge hole, a face guard coupled to a rear surface of the mask body and configured to contact a face of a user, and an air cleaning module filter external air and to supply the filtered air into a breathing space in the face guard. The face gua...