ALEXANDRIA, Va., March 24 -- United States Patent no. 12,582,178, issued on March 24, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus" was invented by Sejeong Ahn (Seoul, South Korea), Sangkyun Baek (Seoul, South Korea), Dongkwon An (Seoul, South Korea), Yeongcheol Mun (Seoul, South Korea) and Dongeun Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus includes a mask body that defines a suction hole and a discharge hole, a face guard detachably coupled to the mask body by magnetic force and configured to contact a face of a user, and an air cleaning module configured to filter external air and to supply the filtered air to a breathing space. The ...