US Patent Issued to LASERTEC on March 17 for "Defect inspection apparatus and defect inspection method" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,281, issued on March 17, was assigned to LASERTEC Corp. (Yokohama, Japan).

"Defect inspection apparatus and defect inspection method" was invented by Shota Fujiki (Yokohama, Japan) and Yoshito Ozaki (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection apparatus according to the present embodiment includes: an irradiation optical system configured to irradiate a sample including a SiC substrate, a buffer layer formed on the SiC substrate, and a drift layer formed on the buffer layer with excitation light; a filter unit configured to control a wavelength band to transmit photoluminescence light generated from the sample...