ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,661, issued on Sept. 29, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).
"In-situ back side plasma treatment for residue removal from substrates" was invented by Tu Hong (Tualatin, Ore.), Chezheng Cao (Beaverton, Ore.), Chunhai Ji (Portland, Ore.) and Ming Li (West Linn, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for processing a substrate loading the substrate onto a plurality of lift pins passing through a pedestal arranged in a processing chamber. The plurality of lift pins are lowered to rest the substrate on the pedestal. A deposition gas mixture is supplied to deposit film on the substrate. The supply of the deposition...