ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,835, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.).
"Coated part for plasma processing chamber" was invented by Lin Xu (Fremont, Calif.), Satish Srinivasan (Newark, Calif.), David Joseph Wetzel (Santa Clara, Calif.), Scott Briggs (Menlo Park, Calif.), Andrew D. Bailey III (Milpitas, Calif.), Yiwei Song (San Jose, Calif.), Michael Julius Kinsler (San Jose, Calif.), John Michael Kerns (Livermore, Calif.), Lei Liu (Fremont, Calif.) and Robin Koshy (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate is provided. A capacitively coupled plasma electrode is within a capacitively ...