ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,498, issued on May 19, was assigned to Lam Research Corp. (Fremont, Calif.).
"Duty cycle control to achieve uniformity" was invented by Alexei M. Marakhtanov (Albany, Calif.), Felix Leib Kozakevich (Sunnyvale, Calif.), Bing Ji (Pleasanton, Calif.), John P. Holland (San Jose, Calif.) and Ranadeep Bhowmick (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with...