US Patent Issued to Lam Research on March 24 for "High selectivity doped hardmask films" (Oregon, California Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,475, issued on March 24, was assigned to Lam Research Corp. (Fremont, Calif.).

"High selectivity doped hardmask films" was invented by Sonal Bhadauriya (Beaverton, Ore.), Ragesh Puthenkovilakam (Portland, Ore.), Kapu Sirish Reddy (Portland, Ore.), Seshasayee Varadarajan (Lake Oswego, Ore.) and Shruti Vivek Thombare (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to high selectivity doped hardmask films, as well as methods of providing and using such films. In particular examples, the high selectivity doped hardmask film can be employed as a hardmask, an intermediate layer, or a coverage layer."

The ...